Discover the engineering behind EUV light generation using tin droplets, laser plasma and a collector mirror to create light with a wavelength of 13.5 nanometers for advanced chipmaking. | ASML

The Most Complex Machine: EUV Lithography Systems Redefine Moore’s Law In the race to advance technology, one machine stands as a pinnacle of engineering marvel: the Extreme Ultraviolet (EUV) lithography system. Designed to etch the finest circuit patterns onto silicon wafers, this groundbreaking tool employs light with a wavelength of just 13.5 nanometers—smaller than a virus particle. The shift to such radically shorter wavelengths has unlocked the ability to create chips with transistor featu